• DocumentCode
    3689784
  • Title

    Nanocarbon interconnects: Demonstration of properties better than Cu and remaining issues

  • Author

    Shintaro Sato

  • Author_Institution
    Fujitsu Laboratories Ltd, 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan
  • fYear
    2015
  • fDate
    5/1/2015 12:00:00 AM
  • Firstpage
    313
  • Lastpage
    316
  • Abstract
    Nanocarbon materials including graphene and carbon nanotubes (CNTs) are promising candidates for future LSI interconnects. We recently demonstrated sub-10-nm-wide graphene interconnects whose resistivity is lower than that of Cu with similar dimensions. In this paper, we first describe the fabrication and evaluation of such graphene interconnects. We then explain a newly-developed fabrication process for carbon nanotube (CNT) vias and plugs, which relies on implantation of CNTs into sub-micrometer-sized holes. We then point out further issues to be addressed for realizing nanocarbon interconnects.
  • Keywords
    "Plugs","Conductivity","Graphene","Films","Fabrication","Substrates","Lithography"
  • Publisher
    ieee
  • Conference_Titel
    Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM), 2015 IEEE International
  • ISSN
    2380-632X
  • Electronic_ISBN
    2380-6338
  • Type

    conf

  • DOI
    10.1109/IITC-MAM.2015.7325589
  • Filename
    7325589