• DocumentCode
    3689807
  • Title

    Influence of alloying elements on the phase formation of ultrathin Ni (<10nm) on Si(001) substrates

  • Author

    F. A. Geenen;K. Van Stiphout;J. Jordan-Sweef;A. Vantomme;C. Lavoie;C. Detavernier

  • Author_Institution
    Ghent university, Dept. of Solid-State Physics
  • fYear
    2015
  • fDate
    5/1/2015 12:00:00 AM
  • Firstpage
    183
  • Lastpage
    186
  • Abstract
    The influence of Ni thickness on the formation of Nickel suicides was systematically investigated between 0 and 15nm. Annealing thickness gradients distinguishes Alms that agglomerate (>5nm) and films that are morphologically stable (<;5nm). Alloying the initial Ni layer influences this critical thickness to higher (Al, Co) and lower (Ge, Pd, Pt) values. Pole figures and in situ XRD provides information to understand this observed shift in critical thickness.
  • Keywords
    "Physics","Silicides","Alloying","Synchrotrons","Light sources"
  • Publisher
    ieee
  • Conference_Titel
    Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM), 2015 IEEE International
  • ISSN
    2380-632X
  • Electronic_ISBN
    2380-6338
  • Type

    conf

  • DOI
    10.1109/IITC-MAM.2015.7325615
  • Filename
    7325615
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3689807