• DocumentCode
    3689821
  • Title

    Stability of GeTe-based phase change material stack under thermal stress: Reaction with Ti studied by combined in-situ x-ray diffraction, sheet resistance and atom probe tomography

  • Author

    Dominique Mangelinck;Magali Putero;Marion Descoins;Carine Perrin-Pellegrino

  • Author_Institution
    IM2NP, CNRS, Aix-Marseille Université
  • fYear
    2015
  • fDate
    5/1/2015 12:00:00 AM
  • Firstpage
    71
  • Lastpage
    74
  • Abstract
    In situ sheet resistance and x-ray diffraction measurements were used simultaneously during heat treatment to study Ti electrodes in contact with Ge-Te phase change materials. Ti is found to react with GeTe forming TiTe2 and Ge. Atom probe tomography analyses confirm the presence of these two phases after a 400°C heat treatment.
  • Keywords
    "Temperature measurement","Tin","Probes","Electrical resistance measurement","X-ray scattering","Phase change materials","Atomic measurements"
  • Publisher
    ieee
  • Conference_Titel
    Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM), 2015 IEEE International
  • ISSN
    2380-632X
  • Electronic_ISBN
    2380-6338
  • Type

    conf

  • DOI
    10.1109/IITC-MAM.2015.7325629
  • Filename
    7325629
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3689821