DocumentCode :
3691940
Title :
Capacitance density and breakdown voltage improvement by optimizing the PECVD dielectric film characteristics in metal insulator metal capacitors-Chin-Tsan Yeh
Author :
Szu-Ming Chu;Tunn Louh;Ling-Wuu Yang;Tahone Yang;Kuang-Chao Chen
Author_Institution :
Macronix International Co. Ltd, Technology Development Center No. 16, Li-Hsin Road, Science-Based Industrial Park, Hsinchu, Taiwan, R. O. C.
fYear :
2015
Firstpage :
1
Lastpage :
4
Abstract :
Metal-insulator-metal (MIM) capacitors play an important role in the fields of power management IC and LCD gate driver components. [1-2] MIM is a capacitor that consists of two metal layers separated by a dielectric film. Figure 1 shows the cross-section image of a typical MIM capacitor. The dielectric film properties including refractive index, dielectric constant and bonding structure which dominate the MIM capacitance density and breakdown performance.[3].
Keywords :
"Silicon compounds","Capacitance","Bonding","MIM capacitors","Dielectric films","Refractive index"
Publisher :
ieee
Conference_Titel :
Joint e-Manufacturing and Design Collaboration Symposium (eMDC) & 2015 International Symposium on Semiconductor Manufacturing (ISSM), 2015
Type :
conf
Filename :
7328900
Link To Document :
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