• DocumentCode
    3691940
  • Title

    Capacitance density and breakdown voltage improvement by optimizing the PECVD dielectric film characteristics in metal insulator metal capacitors-Chin-Tsan Yeh

  • Author

    Szu-Ming Chu;Tunn Louh;Ling-Wuu Yang;Tahone Yang;Kuang-Chao Chen

  • Author_Institution
    Macronix International Co. Ltd, Technology Development Center No. 16, Li-Hsin Road, Science-Based Industrial Park, Hsinchu, Taiwan, R. O. C.
  • fYear
    2015
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Metal-insulator-metal (MIM) capacitors play an important role in the fields of power management IC and LCD gate driver components. [1-2] MIM is a capacitor that consists of two metal layers separated by a dielectric film. Figure 1 shows the cross-section image of a typical MIM capacitor. The dielectric film properties including refractive index, dielectric constant and bonding structure which dominate the MIM capacitance density and breakdown performance.[3].
  • Keywords
    "Silicon compounds","Capacitance","Bonding","MIM capacitors","Dielectric films","Refractive index"
  • Publisher
    ieee
  • Conference_Titel
    Joint e-Manufacturing and Design Collaboration Symposium (eMDC) & 2015 International Symposium on Semiconductor Manufacturing (ISSM), 2015
  • Type

    conf

  • Filename
    7328900