• DocumentCode
    3691947
  • Title

    Novel solution for in-line analysis of noble metallic impurities on silicon wafer surface

  • Author

    Jiahong Wu;Yuji Yamada;Ayako Shimazaki

  • Author_Institution
    Semiconductor &
  • fYear
    2015
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    In this paper, we introduce the composition of SNC solution and clarify the principles why SNC solution can be used to realize the in-line analysis of noble metallic impurities on the silicon wafer surface. We also show several recoveries of noble metals by analyzing the intentionally contaminated wafers.
  • Keywords
    "Impurities","Surface contamination","Hafnium","Silicon","Surface treatment","Gold"
  • Publisher
    ieee
  • Conference_Titel
    Joint e-Manufacturing and Design Collaboration Symposium (eMDC) & 2015 International Symposium on Semiconductor Manufacturing (ISSM), 2015
  • Type

    conf

  • Filename
    7328907
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3691947