Title :
Novel solution for in-line analysis of noble metallic impurities on silicon wafer surface
Author :
Jiahong Wu;Yuji Yamada;Ayako Shimazaki
Author_Institution :
Semiconductor &
Abstract :
In this paper, we introduce the composition of SNC solution and clarify the principles why SNC solution can be used to realize the in-line analysis of noble metallic impurities on the silicon wafer surface. We also show several recoveries of noble metals by analyzing the intentionally contaminated wafers.
Keywords :
"Impurities","Surface contamination","Hafnium","Silicon","Surface treatment","Gold"
Conference_Titel :
Joint e-Manufacturing and Design Collaboration Symposium (eMDC) & 2015 International Symposium on Semiconductor Manufacturing (ISSM), 2015
