DocumentCode :
3694846
Title :
Enhanced low voltage digital & analog mixed-signal with 28nm FDSOI technology
Author :
F. Arnaud
Author_Institution :
STMicroelectronics, 850, rue Jean Monnet, 38926 Crolles, France
fYear :
2015
Firstpage :
1
Lastpage :
4
Abstract :
This paper presents superior CMOS behavior in the field of low voltage and analog thanks to Fully Depleted Silicon On Insulator (FDSOI) used for 28nm technology. Performance and total power are improved by +100% and −200% versus regular bulk solution, respectively. Dispersion at low voltage is discussed evidencing 2x reduction thanks to efficient Forward Body Bias (FBB). Finally, key analog metrics such as gm, output voltage gain and matching factor enhancement are demonstrated.
Keywords :
"Low voltage","Transistors","Logic gates","Degradation","Electrostatics","CMOS integrated circuits","Wireless communication"
Publisher :
ieee
Conference_Titel :
SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), 2015 IEEE
Type :
conf
DOI :
10.1109/S3S.2015.7333503
Filename :
7333503
Link To Document :
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