DocumentCode :
36985
Title :
Exploring the Kinetics of Formation and Annealing of Single Particle Displacement Damage in Microvolumes of Silicon
Author :
Raine, M. ; Goiffon, Vincent ; Paillet, P. ; Duhamel, O. ; Girard, S. ; Gaillardin, M. ; Virmontois, Cedric ; Belloir, Jean-Marc ; Richard, N. ; Magnan, Pierre
Author_Institution :
DAM, DIF, Arpajon, France
Volume :
61
Issue :
6
fYear :
2014
fDate :
Dec. 2014
Firstpage :
2826
Lastpage :
2833
Abstract :
An experimental method using a CMOS image sensor as test device is used to study the kinetics of formation and annealing of Single Particle Displacement Damage (SPDD) events in arrays of silicon microvolumes. The dark current level is monitored in real time under neutron irradiation, allowing to detect SPDD events and follow their subsequent annealing behavior. Both short term and long term annealing results are presented, with recordings from 75 ms to 4.5 days after SPDD events, performed with different integration times. A majority of pixels exhibits a continuous logarithmic relaxation; a selection of particular cases is finally presented, corresponding to pixels exhibiting Random Telegraph Signals.
Keywords :
CMOS image sensors; annealing; radiation hardening (electronics); CMOS image sensor; SPDD events; annealing; continuous logarithmic relaxation; dark current level; neutron irradiation; random telegraph signals; silicon microvolumes arrays; single particle displacement damage events; time 75 ms to 4.5 day; Active pixel sensors; Annealing; CMOS image sensors; Dark current; Neutrons; Radiation effects; Active pixel sensor (APS); CMOS image sensor (CIS); annealing; dark current distribution; neutrons; random telegraph signal (RTS); single-particle displacement damage (SPDD);
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.2014.2364397
Filename :
6953317
Link To Document :
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