• DocumentCode
    3706324
  • Title

    Modeling the pumping of electrons through a single dopant atom in a Si MOSFET

  • Author

    Joost van der Heijden;Giuseppe C. Tettamanzi;Sven Rogge

  • Author_Institution
    School of Physics and Centre for Quantum Computation and Communication Technology, University of New South Wales, Sydney NSW 2052, Australia
  • fYear
    2014
  • fDate
    6/1/2014 12:00:00 AM
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Modeling results for the study of a new kind of charge pump geometry, the single dopant atom charge pump (SDA-CP), are presented. The behavior of our SDA-CP is described in terms of frequency, position of the dopant in the channel, binding energy and power applied to the RF gate. These results are particular important as they confirm that the behavior of the SDA-CP, as recently experimentally observed, is quite different from the behavior of a conventional quantum dot (QD) CP. The latter is more easily affected by error mechanisms, while the Coulomb potential of the single dopant atom offers protection from these non-adiabatic errors.
  • Keywords
    "Logic gates","Semiconductor process modeling","Electric potential","Charge pumps","Radio frequency","Mathematical model","Quantum dots"
  • Publisher
    ieee
  • Conference_Titel
    Silicon Nanoelectronics Workshop (SNW), 2014 IEEE
  • Print_ISBN
    978-1-4799-5676-0
  • Type

    conf

  • DOI
    10.1109/SNW.2014.7348561
  • Filename
    7348561