DocumentCode
3706324
Title
Modeling the pumping of electrons through a single dopant atom in a Si MOSFET
Author
Joost van der Heijden;Giuseppe C. Tettamanzi;Sven Rogge
Author_Institution
School of Physics and Centre for Quantum Computation and Communication Technology, University of New South Wales, Sydney NSW 2052, Australia
fYear
2014
fDate
6/1/2014 12:00:00 AM
Firstpage
1
Lastpage
2
Abstract
Modeling results for the study of a new kind of charge pump geometry, the single dopant atom charge pump (SDA-CP), are presented. The behavior of our SDA-CP is described in terms of frequency, position of the dopant in the channel, binding energy and power applied to the RF gate. These results are particular important as they confirm that the behavior of the SDA-CP, as recently experimentally observed, is quite different from the behavior of a conventional quantum dot (QD) CP. The latter is more easily affected by error mechanisms, while the Coulomb potential of the single dopant atom offers protection from these non-adiabatic errors.
Keywords
"Logic gates","Semiconductor process modeling","Electric potential","Charge pumps","Radio frequency","Mathematical model","Quantum dots"
Publisher
ieee
Conference_Titel
Silicon Nanoelectronics Workshop (SNW), 2014 IEEE
Print_ISBN
978-1-4799-5676-0
Type
conf
DOI
10.1109/SNW.2014.7348561
Filename
7348561
Link To Document