DocumentCode
3710832
Title
New BIMOS transistor in 28nm FDSOI technology: Operation in 4-Gate JFET mode
Author
Ph. Galy;S. Athanasiou;S. Cristoloveanu
Author_Institution
STMicroelectronics, 850 rue Jean Monnet, 38920 Crolles, France
fYear
2015
Firstpage
157
Lastpage
160
Abstract
In this paper, we introduce a new BIMOS transistor fabricated with 28nm high-k metal-gate FDSOI UTBB technology. The device is highly flexible and reconfigurable as it can be operated in MOS, Bipolar, Hybrid and 4-Gate modes. We investigate the bias conditions for JFET-like operation and show promising performance even in structures with ultrathin Si film.
Keywords
"Logic gates","JFETs","BiCMOS integrated circuits","Junctions","CMOS integrated circuits","CMOS technology"
Publisher
ieee
Conference_Titel
Semiconductor Conference (CAS), 2015 International
ISSN
1545-827X
Print_ISBN
978-1-4799-8862-4
Type
conf
DOI
10.1109/SMICND.2015.7355193
Filename
7355193
Link To Document