Application of derived optical models for CIGS to an optical monitoring system

Optical models were developed for each of the stages of CIGS 3-stage deposition process using spectroscopic ellipsometry. The optical functions thus derived were used in an optical monitoring system installed in the pilot line at the PVMC´s Halfmoon facility. This system consists of two fiber optic-based spectroscopic reflectometry units, set up in the sputtering line and the CIGS evaporation chamber. The use of regular fiber optics, instead of polarization-maintaining fiber optics, is sufficient for the purpose of process monitoring. In addition, the technique does not need to be used “in-situ”, but the measurements can be taken in-line, and are applicable to a variety of CIGS deposition techniques.