DocumentCode
3711205
Title
Optical properties of InN-based photodetection devices
Author
Lung-Hsing Hsu;Chien-Chung Lin;Yi-Chia Hwang; Chen-Fung Su; Shih-Yen Lin;Hao-Chung Kuo
Author_Institution
Institute of Lighting and Energy Photonics, National Chiao Tung University, Tainan 711, Taiwan
fYear
2015
fDate
6/1/2015 12:00:00 AM
Firstpage
1
Lastpage
4
Abstract
The InN capped with GaN structures is promising for extended visible and infrared absorption. The low growth temperature of GaN/InN epitaxy was fabricated by a low-pressure metal organic chemical vapor deposition system. The strain effect and mixed InxGa1-xN complex of the GaN/InN layer were investigated via Raman and photoluminescence (PL) measurements. The capping GaN with similar growth temperature of previous InN growth induces the gallium diffusion mechanism to form InxGa1-xN complex. The blue-shift phenomenon of multiple GaN/InN peaks with increasing growth temperature was attributed to residual strain and higher Ga content of InGaN. A ZnO/GaN/InN photodetection device is demonstrated with extended IR response, and the quantum efficiency is 2.28%.
Keywords
"Epitaxial growth","Optical variables measurement","Temperature measurement","Nitrogen","Optical devices","Optical materials","Temperature distribution"
Publisher
ieee
Conference_Titel
Photovoltaic Specialist Conference (PVSC), 2015 IEEE 42nd
Type
conf
DOI
10.1109/PVSC.2015.7355923
Filename
7355923
Link To Document