• DocumentCode
    3711328
  • Title

    Epitaxial emitter reverse saturation current density: Modeling and experimental validation

  • Author

    John Renshaw;James Gee

  • Author_Institution
    Applied Materials, Santa Clara, CA, 95054 USA
  • fYear
    2015
  • fDate
    6/1/2015 12:00:00 AM
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Through numerical simulation we explore the sensitivity of the emitter reverse saturation current density (J0e) to surface recombination velocity (SRV) of a uniformly doped phosphorus emitter compared with gaussian profile with similar sheet resistance. The uniformly doped emitter is capable of extremely low J0e´s of <; 10 fA/cm2, but is very transparent and thus extremely sensitive to the surface recombination velocity. While the gaussian profile cannot reach as low recombination, it is however more resilient to higher SRV´s. Finally, we experimentally demonstrate a 2 fA/cm2 total device J0 on a test structure with the same epi emitter explored in the previous simulations.
  • Keywords
    "Epitaxial growth","Surface texture","Chlorine","Phosphorus","Semiconductor process modeling","Semiconductor device reliability"
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialist Conference (PVSC), 2015 IEEE 42nd
  • Type

    conf

  • DOI
    10.1109/PVSC.2015.7356047
  • Filename
    7356047