DocumentCode :
3711657
Title :
Watching the formation of the GaP/Si(100) heterointerface in situ
Author :
Oliver Supplie;Matthias M. May;Sebastian Br?ckner;Andreas N?gelein;Peter Kleinschmidt;Thomas Hannappel
Author_Institution :
Technische Universit?t Ilmenau, Institut f?r Physik, Postfach 100565, 98684, Germany
fYear :
2015
fDate :
6/1/2015 12:00:00 AM
Firstpage :
1
Lastpage :
4
Abstract :
III-V/Si(100) heterointerfaces are essential for future tandem solar cells. We watch their formation in situ with reflection anisotropy spectroscopy (RAS) during chemical vapor deposition and benchmark RAS to LEED and XPS. An optical anisotropy evolves during GaP nucleation on Si(100), agreeing well with that of the buried heterointerface. P and Si photoemission lines exhibit a chemically shifted component, which quantitatively corresponds to one monolayer. We attribute this to Si-P bonds at the heterointerface. We prepare ultrathin, atomically well-ordered, single-domain GaP epilayers. Sub-monolayer amounts of background residuals diffusing on Si(100) prior nucleation highly impact the formation of the heterointerface.
Keywords :
"Atom optics","Silicon","Optical reflection","Inductors","Atomic layer deposition","Indexes","Nuclear measurements"
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialist Conference (PVSC), 2015 IEEE 42nd
Type :
conf
DOI :
10.1109/PVSC.2015.7356381
Filename :
7356381
Link To Document :
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