DocumentCode
3711660
Title
GaAsP/Si dual-junction solar cells grown by MBE and MOCVD
Author
Tyler J. Grassman;Daniel J. Chmielewski;Santino D. Carnevale;John A. Carlin;Steven A. Ringel
Author_Institution
The Ohio State University, Columbus, 43210, USA
fYear
2015
fDate
6/1/2015 12:00:00 AM
Firstpage
1
Lastpage
5
Abstract
Monolithic, direct epitaxial GaAs0.75P0.25/Si dual-junction (2J) solar cell structures have been grown via both molecular beam epitaxy (MBE) and metal-organic chemical vapor deposition (MOCVD). Fabricated test devices show working tandem behavior, with clear voltage addition and spectral partitioning, in both cases. Due to the thermal sensitivity of the MBE-grown tunnel junction structure, growth conditions necessary to maintain 2J activity yielded reduced quality GaAs0.75P0.25 top cell, while the more robust MOCVD-based tunnel junction enabled higher-quality top cell growth, resulting in overall higher performance 2J behavior. These initial prototype cells show promising performance and suggest several definite pathways for further device refinement.
Keywords
"Junctions","Silicon","Computer architecture","Photovoltaic cells","MOCVD","Microprocessors","Molecular beam epitaxial growth"
Publisher
ieee
Conference_Titel
Photovoltaic Specialist Conference (PVSC), 2015 IEEE 42nd
Type
conf
DOI
10.1109/PVSC.2015.7356384
Filename
7356384
Link To Document