SIMS analysis of atomic composition of silicon-germanium films deposited by RF plasma discharge

In this work we study the atomic composition in SiGe:H films as a function of hydrogen dilution. Silane and germane fluxes are kept constant while hydrogen flow is varying to achieve dilutions up to 80 times. Solid content of principle elements as well as contaminants are determined by SIMS. For low dilutions (from 9 to 30), germanium solid content strongly depends on hydrogen dilution since it varies from 0.485 to 0.675. Higher presence of hydrogen in the mixture does not change germanium content which remains close to the value of 0.69.