DocumentCode :
3713819
Title :
Annealing time dependence of zinc oxide thin films memristive behavior
Author :
Nor Azira Akma Shaari;Shafaq Mardhiyana Mohd Kasim;Nur Sa´adah Muhamad Sauki;Sukreen Hana Herman
Author_Institution :
NANO-Electronic Centre, Faculty of Electrical Engineering, Universiti Teknologi MARA, 40450 Shah Alam, Selangor, Malaysia
fYear :
2015
Firstpage :
16
Lastpage :
19
Abstract :
This work focused on the memristive behavior of zinc oxide (ZnO) thin films. ZnO thin films were prepared by sol-gel spin coating technique on the ITO substrate. The deposited thin films were annealed at 300°C in a furnace with variation of annealing time of 30, 60 and 120 minutes. The electrical properties were characterized to obtain the pinched hysteresis loop graph to calculate its Roff/Ron ratio. The sample annealed for 60 minutes has the best switching behavior with highest Roff/Ron ratio of 1.744. The sample also exists in amorphous form as characterized by the X-ray diffraction spectra measurement.
Keywords :
"Annealing","Zinc oxide","II-VI semiconductor materials","Switches","Memristors","Resistance","Indium tin oxide"
Publisher :
ieee
Conference_Titel :
Technology Management and Emerging Technologies (ISTMET), 2015 International Symposium on
Type :
conf
DOI :
10.1109/ISTMET.2015.7358992
Filename :
7358992
Link To Document :
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