DocumentCode :
3721039
Title :
An extraction method of charge trapping site distribution in AlGaN layer in GaN HEMT
Author :
T. Baba;K. Kakushima;H. Wakabayashi;K. Tsutsui;H. Iwai
Author_Institution :
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, Yokohama, Japan
fYear :
2015
Firstpage :
125
Lastpage :
128
Abstract :
The density and distribution of electron traps in AlGaN layer of GaN HEMT have been characterized. Based on electron tunneling between 2DEG and trap sites, the distance and density can be extracted with frequency dependent capacitance and conductance responses. With parameter fitting to measured capacitance and conductance spectra, a trap density of Nbt = 1021 cm-3eV-1 has be extracted. With different gate voltage or measurement temperature, the trap distribution within the AlGaN layer can be extracted under the same frequency range. From measurement temperature dependency, a capture cross section σ0 = 8 × 10-10 cm2 with an activation energy of 0.42 eV has been extracted.
Keywords :
"Aluminum gallium nitride","Wide band gap semiconductors","HEMTs","Electron traps","Logic gates","Temperature measurement","Capacitance"
Publisher :
ieee
Conference_Titel :
Wide Bandgap Power Devices and Applications (WiPDA), 2015 IEEE 3rd Workshop on
Type :
conf
DOI :
10.1109/WiPDA.2015.7369253
Filename :
7369253
Link To Document :
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