DocumentCode
3723411
Title
A novel entropy production based full-chip TSV fatigue analysis
Author
Tianchen Wang;Sandeep Kumar Samal;Sung Kyu Lim;Yiyu Shi
Author_Institution
University of Notre Dame, IN, USA
fYear
2015
Firstpage
744
Lastpage
751
Abstract
Through-silicon vias (TSVs) are subject to thermal fatigue due to stress over time, no matter how small the stress is. Existing works on TSV fatigue all rely on measurement-based parameters to estimate the lifetime, and cannot consider detailed thermal profiles. In this paper, we propose a new method for TSV fatigue prediction using entropy production during thermal cycles, which is validated by theoretical analysis and measurement results. By combining thermodynamics and mechanics laws, the fatigue process can be quantitatively evaluated with detailed thermal profiles. Experimental results show that interestingly, the landing pad possesses the most easy-to-fail region, which generates up to 50% more entropy compared with the TSV body. The impact of landing pad dimension and TSV geometries are also studied, providing guidance for reliability enhancement. Finally, full-chip fatigue analysis is performed based on stress superposition. To the best of the authors´ knowledge, this is the first TSV fatigue model that is free of measurement data fitting, the first that is capable of considering detailed thermal profiles, and the first framework for efficient full-chip TSV fatigue analysis.
Keywords
"Fatigue","Entropy","Stress","Production","Strain","Plastics","Through-silicon vias"
Publisher
ieee
Conference_Titel
Computer-Aided Design (ICCAD), 2015 IEEE/ACM International Conference on
Type
conf
DOI
10.1109/ICCAD.2015.7372644
Filename
7372644
Link To Document