Title :
Characteristics of the coherent EUV light source for EUV metrology
Author :
Yong Soo Kim;Younghee Kim;June Park;Hamin Sung;Jomsool Kim;Ju Han Lee;Young Min Jhon
Author_Institution :
Korea Institute of Science of Technology, 5, Hwarang-ro 14-gil, Seongbuk-gu, Seoul, Korea
Abstract :
Coherent EUV light at 13.5 nm was generated by high-harmonic generation using a 35-fs pulsed laser at 796 nm in Ne gas, which showed stable operation within 5% deviation over an hour.
Keywords :
"Ultraviolet sources","Laser beams","Lithography","Inspection","Frequency conversion","Diffraction gratings"
Conference_Titel :
Lasers and Electro-Optics Pacific Rim (CLEO-PR), 2015 11th Conference on
DOI :
10.1109/CLEOPR.2015.7375815
