DocumentCode :
3725872
Title :
Aluminum infrared plasmonic perfect absorbers fabricated by colloidal lithography
Author :
Thang Duy Dao;Kai Chen;Satoshi Ishii;Akihiko Ohi;Toshihide Nabatame;Masa-hiro Kitajima;Tadaaki Nagao
Author_Institution :
International Center for Materials Nanoarchitectonics, National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan
Volume :
1
fYear :
2015
Firstpage :
1
Lastpage :
2
Abstract :
We report on the fabrication of large-area aluminum plasmonic perfect absorber (Al-PA) using colloidal lithography combined with reactive ion etching process. Using the Al-PA, we demonstrate selective thermal emitters and tailor-made molecular vibrational sensing.
Keywords :
"Plasmons","Reflectivity","Films","Colloidal lithography","Absorption","Fabrication","Sensors"
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Pacific Rim (CLEO-PR), 2015 11th Conference on
Type :
conf
DOI :
10.1109/CLEOPR.2015.7375862
Filename :
7375862
Link To Document :
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