Title :
Nanolithography using micro-scale mask enabled by hyperbolic metamaterial
Author :
Donghwan Kim;Yong Rae Cho;Bumki Min
Author_Institution :
Department of Mechanical Engineering, Korea advanced institute of science and technology, Daejeon, 305-701, South Korea
Abstract :
We newly developed a nano-scale patterning method overcoming the diffraction limit of conventional photo-lithography technique by utilizing micro-scale aluminum mask-hyperbolic metamaterials hybrid structures, which is supported by our numerical simulation and experimental results.
Conference_Titel :
Lasers and Electro-Optics Pacific Rim (CLEO-PR), 2015 11th Conference on
DOI :
10.1109/CLEOPR.2015.7376518
