Title :
Nanoscale characterization of ultra-thin tungsten films deposited by radio-frequency magnetron sputtering
Author :
Tom?? Mart?nek;Josef Kud?lka;Milan Navr?til;Vojt?ch K?es?lek;Anton?n Fejfar;Mat?j H?vl;Jaroslav Sobota
Author_Institution :
Tomas Bata University in Zl?n, Faculty of Applied Informatics, Czech Republic
fDate :
7/1/2015 12:00:00 AM
Abstract :
In this article, atomic force microscopy was used for nanoscale characterization of ultra-thin tungsten films which were deposited on silicon substrate. Radio-frequency magnetron sputtering was used for tungsten deposition on the surface.
Keywords :
"Films","Tungsten","Atomic measurements","Atomic force microscopy","Force","Surfaces"
Conference_Titel :
Nanotechnology (IEEE-NANO) , 2015 IEEE 15th International Conference on
DOI :
10.1109/NANO.2015.7388651
