• DocumentCode
    3734655
  • Title

    Nanoscale characterization of ultra-thin tungsten films deposited by radio-frequency magnetron sputtering

  • Author

    Tom?? Mart?nek;Josef Kud?lka;Milan Navr?til;Vojt?ch K?es?lek;Anton?n Fejfar;Mat?j H?vl;Jaroslav Sobota

  • Author_Institution
    Tomas Bata University in Zl?n, Faculty of Applied Informatics, Czech Republic
  • fYear
    2015
  • fDate
    7/1/2015 12:00:00 AM
  • Firstpage
    510
  • Lastpage
    513
  • Abstract
    In this article, atomic force microscopy was used for nanoscale characterization of ultra-thin tungsten films which were deposited on silicon substrate. Radio-frequency magnetron sputtering was used for tungsten deposition on the surface.
  • Keywords
    "Films","Tungsten","Atomic measurements","Atomic force microscopy","Force","Surfaces"
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology (IEEE-NANO) , 2015 IEEE 15th International Conference on
  • Type

    conf

  • DOI
    10.1109/NANO.2015.7388651
  • Filename
    7388651
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3734655