DocumentCode :
3734722
Title :
Physics of electronic transport in low-dimensionality materials for future FETs
Author :
Massimo V. Fischetti;William G. Vandenberghe;Ana Suarez Negreira;Zhun-Yong Ong; Bo Fu
Author_Institution :
Department of Materials Science and Engineering, The University of Texas at Dallas, Richardson, USA
fYear :
2015
fDate :
7/1/2015 12:00:00 AM
Firstpage :
759
Lastpage :
761
Abstract :
We discuss why low-dimensionality materials are needed to scale logic devices to the 5 nm gate-length. We discuss the advantages and disadvantages of graphene and graphene nanoribbons, the feasibility of Bose-Einstein condensation in bilayer graphene, and the use of 2D topological insulators, such as halogen-functionalized monolayer tin.
Keywords :
"Graphene","Logic gates","Insulators","Scattering","Tunneling","Leakage currents","Field effect transistors"
Publisher :
ieee
Conference_Titel :
Nanotechnology (IEEE-NANO) , 2015 IEEE 15th International Conference on
Type :
conf
DOI :
10.1109/NANO.2015.7388720
Filename :
7388720
Link To Document :
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