DocumentCode :
3734842
Title :
Contact engineering for nanocarbon interconnects
Author :
Yusuke Abe;Anshul Vyas;Richard Senegor;Patrick Wilhite;Cary Y. Yang
Author_Institution :
Center for Nanostructures, Santa Clara University, CA 95053, USA
fYear :
2015
fDate :
7/1/2015 12:00:00 AM
Firstpage :
1194
Lastpage :
1196
Abstract :
Electron-beam-induced deposited-tungsten (EBID-W) technique is used to fabricate contacts for carbon nanofiber (CNF) horizontal interconnect and carbon nanotube (CNT) vertical vias to improve the contact resistances at the nanocarbon-metal electrodes.
Keywords :
"Resistance","Carbon nanotubes","Contacts","Electrodes","Metallization","Integrated circuit interconnections","Electrical resistance measurement"
Publisher :
ieee
Conference_Titel :
Nanotechnology (IEEE-NANO) , 2015 IEEE 15th International Conference on
Type :
conf
DOI :
10.1109/NANO.2015.7388840
Filename :
7388840
Link To Document :
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