Title :
Contact engineering for nanocarbon interconnects
Author :
Yusuke Abe;Anshul Vyas;Richard Senegor;Patrick Wilhite;Cary Y. Yang
Author_Institution :
Center for Nanostructures, Santa Clara University, CA 95053, USA
fDate :
7/1/2015 12:00:00 AM
Abstract :
Electron-beam-induced deposited-tungsten (EBID-W) technique is used to fabricate contacts for carbon nanofiber (CNF) horizontal interconnect and carbon nanotube (CNT) vertical vias to improve the contact resistances at the nanocarbon-metal electrodes.
Keywords :
"Resistance","Carbon nanotubes","Contacts","Electrodes","Metallization","Integrated circuit interconnections","Electrical resistance measurement"
Conference_Titel :
Nanotechnology (IEEE-NANO) , 2015 IEEE 15th International Conference on
DOI :
10.1109/NANO.2015.7388840
