• DocumentCode
    3741138
  • Title

    Fabrication of metal grating by holographic lithography system

  • Author

    Yunyi Zhuang;Zhen Ye;Zhanqi Gao;Siyuan Zhang;Yongqin Hao;Yuan Feng;Zaijin Li;Yong Wang;Ma Zhenfu

  • Author_Institution
    Changchun University of Science and Technology, Changchun 130022, China
  • fYear
    2015
  • fDate
    7/1/2015 12:00:00 AM
  • Firstpage
    341
  • Lastpage
    344
  • Abstract
    The periodic metal grating is fabricated on SiO2 substrate by holographic lithography and stripping technology. The exposure in holographic lithography is adopted with optimized exposure time of 70s. The metal Al mask is deposited on the substrate by magnetron sputtering system. Images of scanning electron microscopy(SEM) and atomic force microscopy(AFM) show that the metal grating has a period of 528nm, duty cycle of 0.5, thickness of 95nm, with perfect surface morphology, good fringe continuity and uniformity.
  • Keywords
    "Gratings","Metals","Lithography","Diffraction gratings","Holography","Holographic optical components","Integrated optics"
  • Publisher
    ieee
  • Conference_Titel
    Optoelectronics and Microelectronics (ICOM), 2015 International Conference on
  • Type

    conf

  • DOI
    10.1109/ICoOM.2015.7398838
  • Filename
    7398838
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3741138