Title :
Design of distributed Bragg grating in 1064nm narrow linewidth DBR lasers
Author :
Jiyao Du;Hui Li;Yi Qu;Feng Gao
Author_Institution :
National Key Laboratory on High Power Semiconductor Lasers line, Changchun University of Science & Technology, Changchun, China
fDate :
7/1/2015 12:00:00 AM
Abstract :
DBR lasers are attractive light sources due to their narrow linewidth, well stability frequency and large side-mode suppression. In the design, a 3 mm long active gain section and a 1 mm long passive 6th order surface Bragg grating consist of a 4 mm device. The wide of ridge waveguide is 3-4 μm. The rear facets (grating side) are not coated and the front facets are coated to a reflectivity of 30%. For reducing the difficulty of grating fabrication, we choose 6th order surface grating which period is a round 960nm. The effective reflection coefficient of DBR-section is approximately 55% Based on the ridge-waveguide structure, we use holographic lithography and dry etching to fabricate Bragg gating on ridge-waveguide.
Keywords :
"Bragg gratings","Distributed Bragg reflectors","Gratings","Lithography","Optical waveguides","Optical device fabrication"
Conference_Titel :
Optoelectronics and Microelectronics (ICOM), 2015 International Conference on
DOI :
10.1109/ICoOM.2015.7398840