DocumentCode :
3742586
Title :
Design for manufacturing and reliability for nanometer SoCs (system-on-chips)
Author :
Yongchan Ban
Author_Institution :
System IC R&D Lab., LG Electronics 19, Yangjae-daero 11gil, Seocho-gu, Seoul 06772, South Korea
fYear :
2015
Firstpage :
65
Lastpage :
66
Abstract :
As the device dimension increases and chip sizes shrink, on-chip semiconductor process variation can no longer be ignored in the design and signoff static timing analysis of integrated circuits. Thus, we need to ensure not only conventional design closure but also manufacturing closure in nanometer regime. As it has been shown that manufacturing issues are strongly layout dependent, manufacturability aware layout optimization for manufacturing closure shall play a key role in the overall yield improvement. In this paper, we will discuss many manufacturability, variability, reliability, and power aware efforts in design stages for nanometer node SoCs (system-on-chips).
Keywords :
"Yttrium","Lithography","Layout","Integrated circuit interconnections","Optimization","FinFETs"
Publisher :
ieee
Conference_Titel :
SoC Design Conference (ISOCC), 2015 International
Type :
conf
DOI :
10.1109/ISOCC.2015.7401655
Filename :
7401655
Link To Document :
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