DocumentCode
3742597
Title
Capacitive coupled contactless interconnect design for 3D ICs
Author
Tony T. Kim;Myat Thu Linn Aung
Author_Institution
VIRTUS, School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore
fYear
2015
Firstpage
121
Lastpage
122
Abstract
Through-Silicon-Via (TSV) has been considered as a promising technology in 3D integration. However, it has several challenges such as thermal issues, mechanical stress, etc. Contactless interconnect techniques such as inductive coupling and capacitive coupling have been investigated as alternative solutions. In this paper, we present several capacitive coupled interconnect structures. Various challenges in each interconnect structure and design techniques are discussed.
Keywords
"Integrated circuit interconnections","Receivers","Couplings","Arrays","Three-dimensional displays","Parasitic capacitance","Crosstalk"
Publisher
ieee
Conference_Titel
SoC Design Conference (ISOCC), 2015 International
Type
conf
DOI
10.1109/ISOCC.2015.7401666
Filename
7401666
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