DocumentCode :
3748087
Title :
Physical modeling - A new paradigm in device simulation
Author :
Z. Stanojevic;O. Baumgartner;F. Mitterbauer;H. Demel;C. Kernstock;M. Karner;V. Eyert;A. France-Lanord;P. Saxe;C. Freeman;E. Wimmer
Author_Institution :
Global TCAD Solutions GmbH, Landhausgasse 4/1a, 1010 Wien, Austria
fYear :
2015
Abstract :
We go far beyond classical TCAD in and create a simulation framework that is ready for devices based on contemporary and future technology nodes. We do so by extending the common drift-diffusion-type device simulation framework with additional tools: (i) a k p-based subband structure tool, (ii) a deterministic subband Boltzmann transport solver, and (iii) a TCAD-compatible quantum transport solver, to capture every important aspect of device operation at the nano-scale. An atomistic ab-initio tool suite complements the framework providing material properties that would be hard to obtain otherwise. The capabilities of the approach are demonstrated on two different devices featuring non-planar geometry and alternative channel materials.
Keywords :
"Tunneling","Logic gates","Scattering","Indium gallium arsenide","Electric potential","MISFETs","Metals"
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2015 IEEE International
Electronic_ISBN :
2156-017X
Type :
conf
DOI :
10.1109/IEDM.2015.7409631
Filename :
7409631
Link To Document :
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