DocumentCode :
3748090
Title :
Oxide-based RRAM: Requirements and challenges of modeling and simulation
Author :
J. F. Kang;B. Gao;P. Huang;H. T. Li;Y. D. Zhao;Z. Chen;C. Liu;L. F. Liu;X. Y. Liu
Author_Institution :
Institute of Microelectronics, Peking University, Beijing 100871, China
fYear :
2015
Abstract :
New physical insights on the underlying physics from switching behaviors to operating mechanisms of oxide-based RRAM are presented by taking the microstructure nature of switching materials and correlated physical effects with switching process into account. Based on the new physical insights, a platform for HfOx- and TaOx-based RRAM including simulation tools and compact models is developed, which is able to reproduce the essential electrical and microscopic characteristics of RRAM and bridge the link between device and circuit systems, meeting the requirements of device-circuit-system co-design and optimization.
Keywords :
"Switches","Computational modeling","Hafnium compounds","Integrated circuit modeling","Physics","Optimization","Microscopy"
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2015 IEEE International
Electronic_ISBN :
2156-017X
Type :
conf
DOI :
10.1109/IEDM.2015.7409634
Filename :
7409634
Link To Document :
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