• DocumentCode
    3748115
  • Title

    Collapse-free high power InAlGaN/GaN-HEMT with 3 W/mm at 96 GHz

  • Author

    K. Makiyama;S. Ozaki;T. Ohki;N. Okamoto;Y Minoura;Y Niida;Y. Kamada;K. Joshin;K. Watanabe;Y Miyamoto

  • Author_Institution
    Fujitsu Limited, 10-1 Morinosato-Wakamiya, Atsugi, 243-0197, Japan
  • fYear
    2015
  • Abstract
    In this work, we demonstrated an excellent output power (Pout) density of 3.0 W/mm at 96 GHz using a novel collapse-free InAlGaN/GaN-HEMT with an 80-nm gate for a millimeter-wave amplifier. The developed devices showed basic reliability for commercial products. To eliminate the current collapse, a unique double-layer silicon nitride (SiN) passivation film that has oxidation resistance was adopted. We proved the potential of InAlGaN/GaN-HEMT using our unique device technology experimentally and analytically.
  • Keywords
    "HEMTs","Silicon compounds","Reliability","Logic gates","Passivation","Millimeter wave communication"
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 2015 IEEE International
  • Electronic_ISBN
    2156-017X
  • Type

    conf

  • DOI
    10.1109/IEDM.2015.7409659
  • Filename
    7409659