DocumentCode :
3748115
Title :
Collapse-free high power InAlGaN/GaN-HEMT with 3 W/mm at 96 GHz
Author :
K. Makiyama;S. Ozaki;T. Ohki;N. Okamoto;Y Minoura;Y Niida;Y. Kamada;K. Joshin;K. Watanabe;Y Miyamoto
Author_Institution :
Fujitsu Limited, 10-1 Morinosato-Wakamiya, Atsugi, 243-0197, Japan
fYear :
2015
Abstract :
In this work, we demonstrated an excellent output power (Pout) density of 3.0 W/mm at 96 GHz using a novel collapse-free InAlGaN/GaN-HEMT with an 80-nm gate for a millimeter-wave amplifier. The developed devices showed basic reliability for commercial products. To eliminate the current collapse, a unique double-layer silicon nitride (SiN) passivation film that has oxidation resistance was adopted. We proved the potential of InAlGaN/GaN-HEMT using our unique device technology experimentally and analytically.
Keywords :
"HEMTs","Silicon compounds","Reliability","Logic gates","Passivation","Millimeter wave communication"
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 2015 IEEE International
Electronic_ISBN :
2156-017X
Type :
conf
DOI :
10.1109/IEDM.2015.7409659
Filename :
7409659
Link To Document :
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