Title :
Cu BEOL compatible selector with high selectivity (>107), extremely low off-current (?pA) and high endurance (>1010)
Author :
Qing Luo;Xiaoxin Xu;Hongtao Liu;Hangbing Lv;Tiancheng Gong;Shibing Long;Qi Liu;Haitao Sun;Writam Banerjee;Ling Li;Nianduan Lu;Ming Liu
Author_Institution :
Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, China
Abstract :
Selector with high nonlinearity and low leakage current is critical to solve the sneaking current issue in crossbar memory array. In this work, we present a high performance Cu BEOL compatible threshold switching (TS) selector with several outstanding features, such as high nonlinearity (~107), ultra-low off-state leakage current (~pA), robust endurance (> 1010), and sufficient on-state current density (~1 MA/cm2). The observed threshold switching is resulted from the spontaneously rupture of conductive filament in doped HfO2 material. By introducing a tunneling layer in series with the TS layer, the leakage current of the selector is dramatically reduced by more than 5 orders of magnitude. The array level benchmark of this TS selector qualifies its promising potential for 3D storage application.
Keywords :
"Very large scale integration","Decision support systems","Power demand","Plugs","Hafnium compounds","Switches"
Conference_Titel :
Electron Devices Meeting (IEDM), 2015 IEEE International
Electronic_ISBN :
2156-017X
DOI :
10.1109/IEDM.2015.7409669