Title :
Magnetic thin-film inductors for monolithic integration with CMOS
Author :
Noah Sturcken;Ryan Davies;Hao Wu;Michael Lekas;Kenneth Shepard;K. W. Cheng;C. C. Chen;Y. S. Su;C. Y. Tsai;K. D. Wu;J. Y. Wu;Y. C. Wang;K. C. Liu;C. C. Hsu;C. L. Chang;W. C. Hua;Alex Kalnitsky
Author_Institution :
Ferric, Inc., 155 W. 121st St., New York, NY, 10027, USA
Abstract :
This paper presents the fabrication, design and electrical performance of magnetic thin-film inductors for monolithic integration with CMOS for DC-DC power conversion. Magnetic core inductors were fabricated using conventional CMOS processes to achieve peak inductance density of 290nH/mm2, quality factor 15 at 150MHz, current density exceeding 11 A/mm2 and coupling coefficient of 0.89 for coupled inductors.
Keywords :
"Inductors","Inductance","Magnetic cores","Saturation magnetization","CMOS integrated circuits","Magnetic resonance imaging","Couplings"
Conference_Titel :
Electron Devices Meeting (IEDM), 2015 IEEE International
Electronic_ISBN :
2156-017X
DOI :
10.1109/IEDM.2015.7409676
