Title :
Ellipsometric measurement of particle-spiked wafer surfaces
Author :
Eiichi Kondoh;Hayato Kotagiri;Mitsuhiro Watanabe;Satomi Hamada;Shohei Shima;Hirokuni Hiyama
Author_Institution :
University of Yamanashi, Takeda 4, Kofu, 4008511, Japan
Abstract :
This paper studied the ability of ellipsometry for quantitative evaluation of particle contamination. Very good correlation between the ellipsometric measurement and the bead amount was confirmed. This technique can be employed for quick evaluation of wafer cleaning at laboratories.
Keywords :
"Atom optics","Optical films","Optical imaging","Optical scattering","Optical sensors","Microscopy"
Conference_Titel :
Planarization/CMP Technology (ICPT), 2015 International Conference on
