Impact of different developer concentrations for advanced packaging photolithography

Enhancement of developing effect with Tetramethylammonium hydroxide (TMAH) of different concentration beneficially enhances the contour effect of Photo-resist (PR) after development. Tetramethylammonium hydroxide (TMAH) of different concentration is used to evaluate the developing effect on different photo-resist with different thicknesses and critical dimensions. Fabricated with similar patterned wafers; wall profiles and thickness measurement were compared at post development. Volume of developer applied denotes the reduction in chemical consumption and cycle time reduction.