Title :
A novel III-V/Si Chip-on-Wafer Direct Transfer Bonding technology
Author :
Yoichiro Kurita;Miki Inamura;Yasuhide Kakumoto;Yasuhisa Yamada;Tomoyuki Abe
Author_Institution :
Corporate Research & Development Center, Toshiba Corporation
Abstract :
Three-Dimensional (3D) integration of group III-V compound semiconductor material on Si wafer (III-V/Si) is important for next-generation microsystems such as Si photonics or ultra-high-frequency electronics. A technique for direct bonding of III-V chips on a large-diameter Si wafer is an attractive approach for manufacturing these structures, but there is a difficulty in that ultra-clean particle-free surface is required during the III-V wafer dicing and diced chip bonding processes. Therefore, we proposed a new "Chip-on-Wafer Direct Transfer Bonding" (CoW DTB) technology for this purpose, and also developed new equipment for this technology. The processes were evaluated using AlGaInAs/InP Multiple Quantum Well (MQW) epitaxial wafer and Si wafer on which oxide film is deposited, and high-quality bonding was confirmed by Transmission Electron Microscopy (TEM) observation.
Keywords :
"Silicon","III-V semiconductor materials","Bonding","Epitaxial layers","Indium phosphide","Surface treatment","Annealing"
Conference_Titel :
Electronics Packaging and Technology Conference (EPTC), 2015 IEEE 17th
DOI :
10.1109/EPTC.2015.7412409