Substrate optimization for accurate EM simulation

This paper presents an optimization-based technique to develop silicon substrate for accurate and efficient electromagnetic (EM) simulations. The proposed method simplifies the highly nonlinear substrate doping profile into a few regions with effective conductivities. The accuracy of the optimized substrate is validated against measurement data for two spiral inductors. This simplified substrate enables fast and accurate EM simulations. The optimization procedure can be applied to either measurement-based or process simulation-based substrate development, and has a potential to enable EM model creation even before wafer fabrication.