DocumentCode
375754
Title
Preparation of In/sub 2/O/sub 3/ and ITO films using coating photolysis process with ArF excimer laser
Author
Tsuchiya, T. ; Watanabe, A. ; Niino, H. ; Yabe, A. ; Yamaguchi, I. ; Manabe, T. ; Kumagai, T. ; Mizuta, S.
Author_Institution
Nat. Inst. of Mater. & Chem. Res., Ibaraki, Japan
Volume
1
fYear
2001
fDate
15-19 July 2001
Abstract
To prepare the In/sub 2/O/sub 3/ and ITO films without heat treatment, we have studied the metal acetylacetonate coating photolysis process using an ArF excimer laser. In this paper, we will report the experimental procedures and our results.
Keywords
X-ray diffraction; electrical resistivity; indium compounds; photolysis; pulsed laser deposition; semiconductor growth; semiconductor thin films; stoichiometry; tin compounds; ultraviolet spectra; ITO; In/sub 2/O/sub 3/; InSnO; UV spectra; XRD patterns; excimer laser; laser annealing; metal acetylacetonate coating photolysis; nonstoichiometry; patterning; resistivity; spin coating; thin film preparation; transmittance; Atmosphere; Coatings; Conductivity; Crystallization; Indium tin oxide; Optical control; Substrates; Transistors; X-ray diffraction; X-ray lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2001. CLEO/Pacific Rim 2001. The 4th Pacific Rim Conference on
Conference_Location
Chiba, Japan
Print_ISBN
0-7803-6738-3
Type
conf
DOI
10.1109/CLEOPR.2001.967723
Filename
967723
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