Title :
A low-cost solution in generating multiple-bandgaps for 1.55 μm optical fibre communications
Author :
Ng, S.L. ; Lim, H.S. ; Lam, Y.L. ; Chan, Y.C. ; Ooi, B.S. ; Aimez, V. ; Beauvais, J. ; Beerens, J.
Author_Institution :
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore
Abstract :
We have demonstrated that a novel masking technique for low energy quantum well intermixing (QWI), comparable to selective area epitaxy, can be used for the realization of multiple bandgaps in the production of WDM quantum well laser sources, as well as other photonic integrated circuits for use in 1.55 μm optical fibre communications applications
Keywords :
chemical vapour deposition; integrated optoelectronics; ion implantation; masks; optical communication equipment; optical fabrication; photoresists; quantum well lasers; semiconductor technology; ultraviolet lithography; wavelength division multiplexing; 1.55 micron; WDM quantum well laser sources; low energy quantum well intermixing; masking technique; multiple-bandgaps; optical fibre communications; photonic integrated circuits; Dry etching; Electrons; Implants; Optical fibers; Photoluminescence; Photonic band gap; Plasma applications; Plasma chemistry; Plasma immersion ion implantation; Resists;
Conference_Titel :
Lasers and Electro-Optics Society, 2001. LEOS 2001. The 14th Annual Meeting of the IEEE
Conference_Location :
San Diego, CA
Print_ISBN :
0-7803-7105-4
DOI :
10.1109/LEOS.2001.968971
