A 193 nm light source using fiber amplifier and nonlinear wavelength conversion

Author

Owa, S. ; Doi, M. ; Kawai, H. ; Kitano, H. ; Miwa, S. ; Matsuura, H. ; Tokuhisa, A.

Author_Institution

Core Technol. Center, Nikon Corp., Tokyo, Japan

Volume

1

fYear

2001

fDate

2001

Firstpage

56

Abstract

One approach to compact UV light sources is an all-solid-state 193 nm laser system, which utilizes an Er-doped fiber amplifier (EDFA) of 1547 nm wavelength as part of the fundamental light source, and five-stage frequency conversion optics for generating the eighth harmonic of 193 nm light. We propose the use of Gd_xY_1-xCa₄O(BO₃)₃ as the fourth-harmonic crystal to improve the wavelength conversion optics, and report the results of durability tests up to 500 hours

Keywords

erbium; light sources; optical fibre amplifiers; optical harmonic generation; optical wavelength conversion; 1547 nm; 193 nm; 193 nm light source; 500 hour; EDFA; Er-doped fiber amplifier; Gd_xY_1-xCa₄O(BO₃) ₃; all-solid-state 193 nm laser system; compact UV light sources; durability tests; eighth harmonic; five-stage frequency conversion optics; fourth-harmonic crystal; nonlinear wavelength conversion; wavelength conversion optics; Erbium-doped fiber amplifier; Fiber lasers; Fiber nonlinear optics; Frequency conversion; Light sources; Nonlinear optics; Optical fiber amplifiers; Optical harmonic generation; Optical wavelength conversion; Stimulated emission;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics Society, 2001. LEOS 2001. The 14th Annual Meeting of the IEEE

Conference_Location

San Diego, CA

ISSN

1092-8081

Print_ISBN

0-7803-7105-4

Type

conf

DOI

10.1109/LEOS.2001.969170

Filename

969170