Title :
Research activities of optical MEMS in Japan
Author :
Fujita, Hiroyulu
Author_Institution :
Center for Int. Res. on MicroMechatronics, Univ. of Tokyo, Japan
Abstract :
The key concept of MEMS (micro electro mechanical systems) technologies is to extend the VLSI fabrication capability to realize three- dimensional micro systems which are composed of electrical, mechanical, chemical and optical elements. Using VLSI fabrication processes such as photolithography, film deposition and etching, it is possible to obtain sub-micrometer-precision structures in a large quantity with excellent alignment between each other. In addition, movable structures such as micro mirrors and switches can be made by micromachining processes
Keywords :
VLSI; etching; micro-optics; micromechanical devices; mirrors; optical communication equipment; optical fabrication; optical switches; photolithography; sputter etching; Japan; VLSI fabrication; VLSI fabrication processes; alignment structures; dry etching; film deposition; micro electro mechanical systems; micro mirrors; micromachining processes; optical MEMS; optical elements; photolithography; precise V-grooves; sputter etching; sub-micrometer-precision structures; wet etching; Chemical elements; Chemical technology; Etching; Lithography; Mechanical systems; Micromechanical devices; Mirrors; Optical device fabrication; Optical films; Very large scale integration;
Conference_Titel :
Lasers and Electro-Optics Society, 2001. LEOS 2001. The 14th Annual Meeting of the IEEE
Conference_Location :
San Diego, CA
Print_ISBN :
0-7803-7105-4
DOI :
10.1109/LEOS.2001.969175
