Title :
Thermally invariant all-dielectric micromirrors
Author :
Liu, Wei ; Talghader, Joseph J.
Author_Institution :
Dept. of Electr. & Comput. Eng., Minnesota Univ., USA
Abstract :
All-dielectric micromirrors are reported that maintain their shape to within λ/60 at 633 nm over a range of 30 C, limited by the measurement apparatus. In tandem with the experimental results, thermally invariant coating design is discussed along with thermal expansion results from some common dielectric coating materials
Keywords :
deformation; micro-optics; mirrors; optical multilayers; silicon compounds; thermal expansion; thermal stresses; 30 C; 633 nm; SiO2-SiN; SiO2/SiN; common dielectric coating materials; high reflectivity multilayer stack; piston-type electrostatic micromirrors; thermal expansion; thermally invariant all-dielectric micromirrors; thermally invariant coating; Coatings; Dielectrics; Micromirrors; Mirrors; Nonhomogeneous media; Shape measurement; Silicon compounds; Temperature distribution; Thermal expansion; Thermal stresses;
Conference_Titel :
Lasers and Electro-Optics Society, 2001. LEOS 2001. The 14th Annual Meeting of the IEEE
Conference_Location :
San Diego, CA
Print_ISBN :
0-7803-7105-4
DOI :
10.1109/LEOS.2001.969178
