• DocumentCode
    376073
  • Title

    Thermally invariant all-dielectric micromirrors

  • Author

    Liu, Wei ; Talghader, Joseph J.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Minnesota Univ., USA
  • Volume
    1
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    72
  • Abstract
    All-dielectric micromirrors are reported that maintain their shape to within λ/60 at 633 nm over a range of 30 C, limited by the measurement apparatus. In tandem with the experimental results, thermally invariant coating design is discussed along with thermal expansion results from some common dielectric coating materials
  • Keywords
    deformation; micro-optics; mirrors; optical multilayers; silicon compounds; thermal expansion; thermal stresses; 30 C; 633 nm; SiO2-SiN; SiO2/SiN; common dielectric coating materials; high reflectivity multilayer stack; piston-type electrostatic micromirrors; thermal expansion; thermally invariant all-dielectric micromirrors; thermally invariant coating; Coatings; Dielectrics; Micromirrors; Mirrors; Nonhomogeneous media; Shape measurement; Silicon compounds; Temperature distribution; Thermal expansion; Thermal stresses;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics Society, 2001. LEOS 2001. The 14th Annual Meeting of the IEEE
  • Conference_Location
    San Diego, CA
  • ISSN
    1092-8081
  • Print_ISBN
    0-7803-7105-4
  • Type

    conf

  • DOI
    10.1109/LEOS.2001.969178
  • Filename
    969178
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=376073