• DocumentCode
    3762
  • Title

    Low-Temperature Pressure-Less Silver Direct Bonding

  • Author

    Kunimune, Teppei ; Kuramoto, Masafumi ; Ogawa, Shinichi ; Nogi, Masaya ; Suganuma, Katsuaki

  • Author_Institution
    LED Eng. Div., Nichia Corp., Anan, Japan
  • Volume
    3
  • Issue
    3
  • fYear
    2013
  • fDate
    Mar-13
  • Firstpage
    363
  • Lastpage
    369
  • Abstract
    A light-emitting diode (LED) die and a glass substrate, both of which were coated with a few-micrometers-thick silver layer, was successfully direct-bonded above 200°C in air without any pressure. In this silver direct bonding, the following three factors are essential: 1) keeping surfaces of silver layers clean; 2) bonding with a suitable solvent that can be reduced and has a boiling point near the sintering temperature; and 3) avoiding excessive heating. Oxygen concentration in a sintering atmosphere has a great impact on bonding. The surface of a silver layer shows roughening by abnormal grain growth as increasing oxygen resulting in increase of bonding strength. The abnormal grain growth on the surface of silver effectively contributes to the increase of junction area. Sintering at too high temperature, however, causes the formation of large voids, which migrated towards silver/glass interfaces resulting in the reduction of bonding strength. An LED die bonded at 240°C for 2 h can maintain high bonding strength through a heat run test at 350°C for 2 h. Furthermore, transient thermal resistance of an LED die bonded with the silver direct bonding is lower than that of an LED die bonded by traditional eutectic bonding with Au-Sn alloy. This bonding method can realize high thermal conductivity with low-temperature pressure-less process and can contribute to high-power semiconductor devices.
  • Keywords
    bonding processes; eutectic alloys; gold alloys; light emitting diodes; microassembling; silver; sintering; thermal conductivity; tin alloys; Ag; AuSn; LED die; SiO2; abnormal grain growth; boiling point; eutectic bonding; excessive heating avoidance; few-micrometer-thick silver layer; glass substrate; high-power semiconductor devices; light-emitting diode die; low-temperature pressure-less silver direct bonding; low-temperature pressureless process; oxygen concentration; silver-glass interfaces; temperature 240 degC; temperature 350 degC; temperature sintering; thermal conductivity; time 2 h; transient thermal resistance; Bonding; Glass; Heating; Light emitting diodes; Silver; Solvents; Temperature measurement; Bonding; light-emitting diodes; silver;
  • fLanguage
    English
  • Journal_Title
    Components, Packaging and Manufacturing Technology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    2156-3950
  • Type

    jour

  • DOI
    10.1109/TCPMT.2012.2231901
  • Filename
    6407949