Engineering the performance of metal/insulator/metal devices with ALD nanolaminate insulators

Thin film metal-insulator-metal (MIM) devices find application not only as back-end-of-line (BEOL) capacitors (MIMCAPs), but also as tunnel diodes for optical rectenna based IR energy harvesting, IR detectors, large area macroelectronics, hot electron transistors, and as selector devices to avoid sneak leakage in resistive memory (RRAM) crossbar arrays. This invited talk will highlight how nanolaminate combinations of insulators deposited via atomic layer deposition (ALD) can be used to enhance the performance of MIIM diodes and MIIM capacitors as well as discuss reliability issues.