DocumentCode
3762359
Title
Charge feedback mechanisms at forward threshold voltage stress in GaN/AlGaN HEMTs
Author
A. Grill;G. Rzepa;P. Lagger;C. Ostermaier;Hajdin Ceric;T. Grasser
Author_Institution
Christian Doppler Laboratory for Reliability Issues in Microelectronics at the Institute for Microelectronics, TU Wien, Vienna, Austria
fYear
2015
Firstpage
41
Lastpage
45
Abstract
Charge trapping in the insulating layer of gallium-nitride (GaN) metal-insulator-semiconductor high-electron-mobility transistors (MIS-HEMTs) is a serious reliability challenge but is still poorly understood. We demonstrate here that the observed Vth drift and recovery can be understood as charge capture and emission following a non-radiative multi-phonon (NMP) mechanism into traps with widely distributed properties. Furthermore, due to the large amount of trapped charge, the feedback of that charge on the surface potential and thus on the capture and emission times has to be considered self-consistently in order to correctly explain the temporal changes in their distributions.
Keywords
"Stress","Electron traps","Dielectrics","Logic gates","Gallium nitride","Electric potential","Threshold voltage"
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop (IIRW), 2015 IEEE International
Print_ISBN
978-1-4673-7395-1
Electronic_ISBN
2374-8036
Type
conf
DOI
10.1109/IIRW.2015.7437064
Filename
7437064
Link To Document