DocumentCode :
3762359
Title :
Charge feedback mechanisms at forward threshold voltage stress in GaN/AlGaN HEMTs
Author :
A. Grill;G. Rzepa;P. Lagger;C. Ostermaier;Hajdin Ceric;T. Grasser
Author_Institution :
Christian Doppler Laboratory for Reliability Issues in Microelectronics at the Institute for Microelectronics, TU Wien, Vienna, Austria
fYear :
2015
Firstpage :
41
Lastpage :
45
Abstract :
Charge trapping in the insulating layer of gallium-nitride (GaN) metal-insulator-semiconductor high-electron-mobility transistors (MIS-HEMTs) is a serious reliability challenge but is still poorly understood. We demonstrate here that the observed Vth drift and recovery can be understood as charge capture and emission following a non-radiative multi-phonon (NMP) mechanism into traps with widely distributed properties. Furthermore, due to the large amount of trapped charge, the feedback of that charge on the surface potential and thus on the capture and emission times has to be considered self-consistently in order to correctly explain the temporal changes in their distributions.
Keywords :
"Stress","Electron traps","Dielectrics","Logic gates","Gallium nitride","Electric potential","Threshold voltage"
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop (IIRW), 2015 IEEE International
Print_ISBN :
978-1-4673-7395-1
Electronic_ISBN :
2374-8036
Type :
conf
DOI :
10.1109/IIRW.2015.7437064
Filename :
7437064
Link To Document :
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