• DocumentCode
    3762386
  • Title

    Radiation testing of tantalum oxide-based resistive memory

  • Author

    Joshua Holt;Nathaniel Cady;Jean Yang-Scharlotta

  • Author_Institution
    Colleges of Nanoscale Science and Engineering, SUNY Polytechnic Institute, Albany, NY, United States
  • fYear
    2015
  • Firstpage
    155
  • Lastpage
    158
  • Abstract
    Resistive memory (RRAM) is an emerging memory technology, expected to have inherent resistance to radiation damage. We present an initial study characterizing the effects of several types of radiation on a set of tantalum oxide-based RRAM devices. Gamma radiation (64.7 Mrad(Si)) was found to have no significant impact on switching properties. Likewise, ionic radiation (H, N, Ar+) up to 1015 ions/cm2 did not have any significant effect. This resistance to radiation, combined with high endurance and data retention, make RRAM an excellent candidate for use in harsh environments.
  • Keywords
    "Switches","Resistance","Radiation effects","Tantalum","Testing","Transistors","Electrodes"
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop (IIRW), 2015 IEEE International
  • Print_ISBN
    978-1-4673-7395-1
  • Electronic_ISBN
    2374-8036
  • Type

    conf

  • DOI
    10.1109/IIRW.2015.7437091
  • Filename
    7437091