DocumentCode
3762386
Title
Radiation testing of tantalum oxide-based resistive memory
Author
Joshua Holt;Nathaniel Cady;Jean Yang-Scharlotta
Author_Institution
Colleges of Nanoscale Science and Engineering, SUNY Polytechnic Institute, Albany, NY, United States
fYear
2015
Firstpage
155
Lastpage
158
Abstract
Resistive memory (RRAM) is an emerging memory technology, expected to have inherent resistance to radiation damage. We present an initial study characterizing the effects of several types of radiation on a set of tantalum oxide-based RRAM devices. Gamma radiation (64.7 Mrad(Si)) was found to have no significant impact on switching properties. Likewise, ionic radiation (H, N, Ar+) up to 1015 ions/cm2 did not have any significant effect. This resistance to radiation, combined with high endurance and data retention, make RRAM an excellent candidate for use in harsh environments.
Keywords
"Switches","Resistance","Radiation effects","Tantalum","Testing","Transistors","Electrodes"
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop (IIRW), 2015 IEEE International
Print_ISBN
978-1-4673-7395-1
Electronic_ISBN
2374-8036
Type
conf
DOI
10.1109/IIRW.2015.7437091
Filename
7437091
Link To Document