DocumentCode :
376559
Title :
Molecular aligned thin films fabricated by applying surface plasmon resonance [photoelectric conversion efficiency]
Author :
Tanaka, A. ; Yamashita, M.
Author_Institution :
Fac. of Sci. & Technol., Sci. Univ. of´rokyo, Chiba, Japan
Volume :
2
fYear :
2001
fDate :
15-19 July 2001
Abstract :
By inducing a surface plasmon resonance, the thickness of thin films fabricated in vacuum evaporation was determined to investigate the photoelectric conversion efficiency. We accurately fabricated the aligned films with in-situ observations.
Keywords :
attenuated total reflection; molecular orientation; organic semiconductors; photoelectric cells; photoelectricity; semiconductor thin films; surface plasmon resonance; vacuum deposited coatings; vacuum deposition; atomic coupling states; attenuated total reflection; evaporation time; fabrication system; higher-order microcrystalline orientation; in-situ observations; metallophthalocyanine; molecular aligned thin films; p-polarized light; photoelectric conversion efficiency; surface plasmon resonance; two-layer cell; vacuum evaporation; Artificial intelligence; Atomic measurements; Gold; Laser beams; Optical films; Optical materials; Plasmons; Resonance; Substrates; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2001. CLEO/Pacific Rim 2001. The 4th Pacific Rim Conference on
Conference_Location :
Chiba, Japan
Print_ISBN :
0-7803-6738-3
Type :
conf
DOI :
10.1109/CLEOPR.2001.970881
Filename :
970881
Link To Document :
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