Title :
Efficient 193 nm generation by eighth harmonics of Er/sup 3+/-doped fiber amplifier
Author :
Kitano, H. ; Kawai, H. ; Ohtsuki, T. ; Owa, S.
Author_Institution :
Core Technol. Center, Nikon Corp., Tokyo, Japan
Abstract :
We report the narrow-band 193 nm sources using eighth-harmonic generation from the output of an erbium-doped fiber amplifier at 1547 nm. The conversion efficiency from the fundamental, 1547 nm, to 193 nm is 7.0%. To our knowledge, this represents the highest conversion efficiency ever achieved for 193 nm generation by a frequency conversion system.
Keywords :
erbium; optical fibre amplifiers; optical harmonic generation; 1547 nm; 193 nm; conversion efficiency; effective nonlinear coefficient; efficient DUV sources; eighth-harmonic gene:ration; erbium-doped fiber amplifier; frequency conversion system; high repetition pulse amplification; narrow-band sources; nonlinear optical crystals; pulse shaping; Crystals; Erbium; Erbium-doped fiber amplifier; Erbium-doped fiber lasers; Frequency conversion; Optical fiber amplifiers; Optical fibers; Optical pulses; Power generation; Solid lasers;
Conference_Titel :
Lasers and Electro-Optics, 2001. CLEO/Pacific Rim 2001. The 4th Pacific Rim Conference on
Conference_Location :
Chiba, Japan
Print_ISBN :
0-7803-6738-3
DOI :
10.1109/CLEOPR.2001.971000
