Title :
Characterization of silica optical fibers based on chemical etching
Author :
Mononobe, S. ; Ohtsu, M.
Author_Institution :
Special Res. Lab. for Opt. Sci., Kanagawa Acad. of Sci. & Technol. (KAST), Kawasaki, Japan
Abstract :
We propose a method to characterize silica fibers with submicrometer-sized resolution. The method is based on etching in buffered hydrogen fluoride solutions and observing by a scanning electron microscope.
Keywords :
dissolving; etching; optical fibre testing; refractive index; scanning electron microscopy; silicon compounds; SiO/sub 2/; buffered hydrogen fluoride solutions; chemical etching; core diameter; dissolution rates; doped silica core; pure silica clad; relative refractive index difference; scanning electron microscopy; selective etching; silica optical fibers; step index fiber; structural parameters; submicrometer-sized resolution characterization; taper angle; Chemicals; Etching; Hydrogen; Optical buffering; Optical fiber theory; Optical fibers; Refractive index; Scanning electron microscopy; Silicon compounds; Structural engineering;
Conference_Titel :
Lasers and Electro-Optics, 2001. CLEO/Pacific Rim 2001. The 4th Pacific Rim Conference on
Conference_Location :
Chiba, Japan
Print_ISBN :
0-7803-6738-3
DOI :
10.1109/CLEOPR.2001.971030
