DocumentCode
3766958
Title
A study of 3-D Zinc Oxide nanowire field effect transistor with defect and interface charge density
Author
W.H. Khoo;S.M. Sultan
Author_Institution
Computational Nanoelectronics Research Group (CONE), Faculty of Electrical Engineering, Universiti Teknologi Malaysia, Skudai, Johor, Malaysia
fYear
2015
Firstpage
431
Lastpage
434
Abstract
Electrical characteristics of three-dimensional Zinc Oxide nanowire field effect transistor has been studied using 3-D TCAD tool. The device exhibited a good output performance that clearly shows linear and saturation mode with threshold voltage of 0.75V, field-effect mobility of ~108 cm2/v.s and on/off current ratio of ~109. This device is then introduced with defect and interface charge density separately, which results on reduction of the field-effect mobility and an increase of the threshold voltage. This study is useful to determine possible factors causing poor performance of fabricated device and also can work as gas sensor device by putting trap or change the surface charge density.
Keywords
"Zinc oxide","II-VI semiconductor materials","Threshold voltage","Nanoscale devices","Performance evaluation","Logic gates","Silicon"
Publisher
ieee
Conference_Titel
Research and Development (SCOReD), 2015 IEEE Student Conference on
Type
conf
DOI
10.1109/SCORED.2015.7449373
Filename
7449373
Link To Document