• DocumentCode
    3766958
  • Title

    A study of 3-D Zinc Oxide nanowire field effect transistor with defect and interface charge density

  • Author

    W.H. Khoo;S.M. Sultan

  • Author_Institution
    Computational Nanoelectronics Research Group (CONE), Faculty of Electrical Engineering, Universiti Teknologi Malaysia, Skudai, Johor, Malaysia
  • fYear
    2015
  • Firstpage
    431
  • Lastpage
    434
  • Abstract
    Electrical characteristics of three-dimensional Zinc Oxide nanowire field effect transistor has been studied using 3-D TCAD tool. The device exhibited a good output performance that clearly shows linear and saturation mode with threshold voltage of 0.75V, field-effect mobility of ~108 cm2/v.s and on/off current ratio of ~109. This device is then introduced with defect and interface charge density separately, which results on reduction of the field-effect mobility and an increase of the threshold voltage. This study is useful to determine possible factors causing poor performance of fabricated device and also can work as gas sensor device by putting trap or change the surface charge density.
  • Keywords
    "Zinc oxide","II-VI semiconductor materials","Threshold voltage","Nanoscale devices","Performance evaluation","Logic gates","Silicon"
  • Publisher
    ieee
  • Conference_Titel
    Research and Development (SCOReD), 2015 IEEE Student Conference on
  • Type

    conf

  • DOI
    10.1109/SCORED.2015.7449373
  • Filename
    7449373